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Surface potential measuring apparatus and surface potential measuring method
专利权人:
Ebara Corporation
发明人:
Ishibashi Tomoatsu
申请号:
US201414197101
公开号:
US9194903(B2)
申请日:
2014.03.04
申请国别(地区):
美国
年份:
2015
代理人:
Baker & Hostetler LLP
摘要:
An apparatus for measuring a surface potential of an object on an underlying structure is disclosed. A relatively-moving mechanism moves a probe and a second support member relative to each other until the probe faces a reference structure on the second support member, an electric potential measuring device measures the surface potential of the reference structure through the probe, the controller calibrates the electric potential measuring device such that a measured value of the surface potential of the reference structure becomes 0, the relatively-moving mechanism moves the probe and a first support member relative to each other until the probe faces the object on the first support member after the calibration, and the electric potential measuring device measures the surface potential of the object through the probe.
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中国工程科技知识中心
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