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氫氣生成裝置及包含其之氫氣吸入裝置
专利权人:
TANAH PROCESS LTD.
发明人:
TANAHASHI, SEIJI,棚桥正治,棚橋正治,KOJIMA, TAMAO,小岛环生,小島環生,WAKAI, YOSHIMASA,若井由匡,TANAHASHI, MASAKAZU,棚桥正和,棚橋正和
申请号:
TW106209494
公开号:
TWM555856U
申请日:
2017.06.29
申请国别(地区):
TW
年份:
2018
代理人:
摘要:
The utility model provides an even the hydrogen generates device and generates hydrogen suction apparatus of device including this hydrogen that the pressure of the hydrogen under the circumstances that the flow path of hydrogen was cut off in the device also can not the exceedingly uprises. Disclosed hydrogen in the same way generates device (100) and includes: electricity decomposition unit (membrane electrode conjugant (23), it includes positive pole and negative pole for carry out the electric decomposition to water, water pitcher (30) (the first trough), the water that its subtend positive pole was supplied with keeps, first flow path (41), its hydrogen that supplies to generate at the negative pole flows, and downriver is connected with the hydrogen flow path that the hydrogen supplyair current moved. The water pitcher has and is used for the gas discharge mouth (30h) of emitting the outside that the gas in the water pitcher generated the device to hydrogen. Hydrogen generates the device and has a hydrogen discharging gear, and the flowing when being suppressed of the hydrogen of this hydrogen discharging gear in the hydrogen flow path makes the hydrogen stream that flows through first flow path go into in the water pitcher and emit hydrogen from the gas discharge mouth.本新型提供一種即便於氫氣之流路被阻斷之情形時裝置內之氫氣之壓力亦不過度變高的氫氣生成裝置。本新型所揭示之一例之氫氣生成裝置100包含:電解單元(薄膜電極組23),其包含陽極與陰極,且用以將水電解;水箱30(第1槽),其保持供給至陽極之水;及第1流路41,其係供在陰極生成之氫氣流動之流路,且於下游連接供氫氣流動之氫氣流路44及201。水箱30具有用以將水箱30內之氣體向裝置之外部釋放之氣體釋放口30h。裝置100具有於氫氣流路201中之氫氣之流動受到抑制時,藉由使通過第1流路41流動之氫氣流至水箱30內而自氣體釋放口30h釋放氫氣之機構。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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