Keita ABE,Toshiaki OZAWA,Yuri OKUTANI,Daisuke SAWA
申请号：
US16603953
公开号：
US20200121577A1
申请日:
2018.04.06
申请国别(地区):
US
年份:
2020
代理人:
摘要：
The present invention relates to a skin cleansing composition which can sufficiently exhibit an excellent keratotic plug-removing effect without a burden such as pain and irritation on the skin. The skin cleansing composition comprises 0.08 mass % or more and 35 mass % or less of (X) 2-amino-2-methyl-1-propanol and has a pH of 9.3 or more and 12.5 or less at 25° C.
