Keita ABE,Toshiaki OZAWA,Yuri OKUTANI,Daisuke SAWA
申请号：
US16604034
公开号：
US20200155434A1
申请日:
2018.04.06
申请国别(地区):
US
年份:
2020
代理人:
摘要：
The present invention relates to a skin cleansing composition which can sufficiently exhibit an excellent keratotic plug-removing effect without a burden, such as pain and irritation, on the skin.The skin cleansing composition comprises 0.08 mass % or more and 35 mass % or less of (X) 2-amino-2-hydroxymethyl-1,3-propanediol and has a pH of 8.6 or more and 12.5 or less at 25° C.
