This invention relates to a dental implant system and in particular, this invention relates to an implant system treated with different chemicals with innovative thread profile . More particularly, this present invention relates to an implant system have a wider implant structure and wider platform in comparison to the conventional dental implants which has been used in dentistry for a long period of time. Furthermore, this invention also relates to a dental implant system which has simple structure, low manufacturing cost, high retention load intensity and excellent early stability.
