Family of electrodes for use in performing in situ fenestration using a plasma RF catheter

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专利权人:

Walter Bruszewski

发明人:

Walter Bruszewski,Masoumeh Mafi

申请号：

US12106677

公开号：

US08292885B2

申请日:

2008.04.21

申请国别(地区):

US

年份:

2012

代理人:

摘要：

To facilitate the widespread use of the RF plasma catheter to provide in situ fenestration of a main stent-graft, potential side-effects of the fenestration are ameliorated using an electrode from a family of electrodes. Specifically, a family of electrodes is provided so that for a particular application, an appropriate electrode can be selected.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/