INSTITUTE OF NATIONAL COLLEGES OF TECHNOLOGY JAPAN
发明人:
YAGYU YOSHIHITO,柳生 義人
申请号：
JP2014101544
公开号：
JP2015217028A
申请日:
2014.05.15
申请国别(地区):
JP
年份:
2015
代理人:
摘要：
PROBLEM TO BE SOLVED: To provide a plasma sterilizer that efficiently sterilizes a sterilization object by remarkably improving the enlargement and stability of a plasma discharge gas area.SOLUTION: A plasma sterilizer 10 that supplies a raw material gas A between electrodes facing each other to generate plasma discharge and sterilizes a sterilization object using the plasma discharge, comprises: raw material gas supply means comprising a plurality of supply ports 11 for supplying the raw material gas A from the plurality of supply ports 11 a high-potential electrode 2a that is formed along the supply ports 11 disposed at uniform intervals in the vicinity of a two-dimensional plane where the supply ports 11 of the raw material gas supply means are disposed a low-potential electrode 2b that is disposed along the high-potential electrode 2a and applying means 3 that applies an AC voltage to the high-potential electrode 2a and/or the low-potential electrode 2b. The raw material gas A is discharged from the supply ports 11 to an electric field formed by the high-potential electrode 2a and the low-potential electrode 2b to which the AC voltage is applied by the applying means 3 to sterilize the sterilization object without damaging it.COPYRIGHT: (C)2016,JPO&INPIT【課題】プラズマ放電ガス領域の大面積化及び安定性を格段に向上させることによって、殺菌対象物を効率的に殺菌するプラズマ殺菌装置の提供。【解決手段】プラズマ殺菌装置10は、対向する電極間に原料ガスAを供給してプラズマ放電を発生させ、このプラズマ放電を用いて殺菌対象物を殺菌するプラズマ殺菌装置において、複数の供給口11からなり、複数の供給口11から原料ガスAを供給する原料ガス供給手段と、原料ガス供給手段の供給口11が配設される二次元平面の近傍で、均一な間隔で配設される供給口11に沿って形成される高電位電極2aと、高電位電極2aに沿って配設される低電位電極2bと、高電位電極2a及び/又は低電位電極2bに交流電圧を印加する印加手段3とを備え、印加手段3により交流電圧が印加された高電位電極2aと低電位電極2bとで形成される電場に供給口11から原料ガスAを放出し、殺菌対象物を損傷することなく殺菌する。【選択図】図1
