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Equipment mounting base for X-ray apparatus and X-ray apparatus provided with the same
专利权人:
ニコン・メトロロジー・エヌヴェ
发明人:
ベン・プライス,マイケル・ビーチェイ,ジェームズ・スミス
申请号:
JP2017507729
公开号:
JP6556830B2
申请日:
2015.08.12
申请国别(地区):
JP
年份:
2019
代理人:
摘要:
An equipment mount for an x-ray apparatus is disclosed. The mount comprises a main shield element, a peripheral shield element and a secondary shield element arranged to permit a mounting element to pass through the main shield element in a shielded manner. A support apparatus for an x-ray apparatus is also disclosed. The support apparatus comprises a separable bearing for translating a support part between a first position and a second position and an elevator mechanism for translating the support part from the second position to a third position, thereby separating the bearing. A manipulator stage for an x-ray apparatus is also disclosed. The stage comprises a first support structure arranged to support a sample stage and supported at first and second positions either side of the sample stage by second and third support structures, the second and third support structures being configured to allow the first support structure to raise and lower while remaining supported at both ends.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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