Aurora Ma Brieva Delgado;Jose Luis Alonso Lebrero;Salvador Gonzalez Rodriguez;Marta Dominguez Valdes-Hevia;Antonio Guerrero Gomez-Pamo;Fernando Garcia Martinez;Juan Pablo Pivel Ranieri
发明人:
Antonio Guerrero Gomez-Pamo,Marta Dominguez Valdes-Hevia,Aurora Ma Brieva Delgado,Fernando Garcia Martinez,Jose Luis Alonso Lebrero,Salvador Gonzalez Rodriguez,Juan Pablo Pivel Ranieri
申请号：
US13317574
公开号：
US09233263B2
申请日:
2011.10.21
申请国别(地区):
US
年份:
2016
代理人:
摘要：
The composition comprises of a component A selected from a hydroxylated derivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of a hexose, and their mixtures； and a component B selected from quinic acid, shikimic acid, their alkaline metal or alkaline earth salts, their methyl esters, and mixtures of the same. This composition is suitable for protecting the skin against ultraviolet radiation coming from the sun or artificial sources, such as those used in phototherapy units and in sun tanning rooms. For application in the field of dermatology and nutrition, and, in particular, in the photoprotection of the skin and mucosa, photo-ageing and photocarcinogenesis, including protection of the immune system associated with the skin.
