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Amide compound or salt thereof, and biofilm inhibitor, biofilm remover and disinfectant containing the same
专利权人:
Hiroaki Suga
发明人:
Hiroaki Suga,Jun Igarashi
申请号:
US13567695
公开号:
US08748617B2
申请日:
2012.08.06
申请国别(地区):
US
年份:
2014
代理人:
摘要:
The present invention provides a new amide compound and salt thereof that is capable of inhibiting biofilm formation or removing deposited biofilms. The present invention also provides a biofilm formation inhibitor or a biofilm remover containing the amide compound or salt thereof as an active ingredient.An amide compound or salt thereof according to the present invention is denoted by General Formula (1):wherein R1 is a hydrogen atom or a hydroxyl group, R2 is a C5-12 alkyl group, and Q is a substituent denoted by Formula (Q1) or (Q2),wherein n and m are 0 or 1.
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