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Charged particle beam apparatus permitting high-resolution and high-contrast observation
专利权人:
发明人:
Muneyuki Fukuda,Naomasa Suzuki,Tomoyasu Shojo,Noritsugu Takahashi
申请号:
US14334837
公开号:
US09159533B2
申请日:
2014.07.18
申请国别(地区):
US
年份:
2015
代理人:
摘要:
A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
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中国工程科技知识中心
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