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流体取扱装置および流体取扱方法
专利权人:
株式会社エンプラス
发明人:
小野 航一
申请号:
JP20120160407
公开号:
JP6068850(B2)
申请日:
2012.07.19
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
A fluid treatment device (100) has a first substrate (210), a second substrate (120), and a resin film (130) located between the first substrate (210) and the second substrate (120). On the first substrate (210) are formed a first flow channel (111), a region (214) facing a valve formed at the end of the first flow channel (111), a second flow channel (112), and a barrier wall (215) located between the region (214) facing the valve and the end of the second flow channel (112). On the second substrate (120) is formed a pressure compartment (123). The region (214) facing the valve and the barrier wall (215) face the pressure compartment (123) on opposite sides of a diaphragm (131) of resin film (130).
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中国工程科技知识中心
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