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2流体ノズル及び基板液処理装置並びに基板液処理方法
专利权人:
東京エレクトロン株式会社
发明人:
金子 聡,甲斐 義広
申请号:
JP20150081633
公开号:
JP6069398(B2)
申请日:
2015.04.13
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a two-fluid nozzle capable of uniformly spraying small-diameter liquid droplets of a processing liquid, and a substrate liquid processing device and a substrate liquid processing method using the two-fluid nozzle.SOLUTION: There is provided a two-liquid nozzle (34) in which a processing liquid discharged from a liquid discharge part (48) and a gas discharged from a gas discharge port (52) are mixed and liquid droplets of the processing liquid thereby generated are sprayed toward a processing target body. In the two-liquid nozzle, the liquid discharge part (48) comprises a plurality of liquid discharge ports (47) arranged on the same circumference on the inner side of the gas discharge port (52). The plurality of liquid discharge ports (47) are arranged such that a gap between the neighboring liquid discharge ports (47) is set to the one where the processing liquids discharged from the respective liquid discharge ports (47) do not come into contact with each other, and the resp
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