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Method of generating a compensation matrix during a substrate inspection
专利权人:
KOH YOUNG TECHNOLOGY INC.
发明人:
Jung Seungwon,Choi Jongjin,You Heewook
申请号:
US201415021341
公开号:
US10151705(B2)
申请日:
2014.09.11
申请国别(地区):
美国
年份:
2018
代理人:
Kile Park Reed & Houtteman PLLC
摘要:
The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N1 (N1≥2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps N2 times (N2≥1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the max
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中国工程科技知识中心
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