PROBLEM TO BE SOLVED: To provide a fluid concentration/vaporization device needing no conveyance of high-concentration hydrogen peroxide solution, with low adverse effect on electronic apparatuses and capable of downsizing.SOLUTION: A fluid concentration/vaporization device comprises: a vaporization chamber in which the inflow and outflow ports are comprised and the aqueous solution of high-boiling point liquid having a standard boiling point higher than 100°C is housed a flow rate controller controlling the flow rate of the vapor flowing out of the outflow port a heater heating the prescribed places of the vaporization chamber and the flow rate controller a discharge flow channel through which the vapor flow-controlled in the flow rate controller is discharged a drain flow channel branched from the discharge flow channel a switching valve switching the discharge flow channel and the drain flow channel and a controller switching the switching valve from the drain flow channel to the discharge flow channel when the concentration of the high-boiling point liquid in the aqueous solution in the vaporization chamber is a prescribed estimated level or higher.COPYRIGHT: (C)2016,JPO&INPIT【課題】 高濃度の過酸化水素水を輸送する必要がなく、電子機器への悪影響も少なく、且つ、小型化し得る流体濃縮気化装置を提供する。【解決手段】 流入口及び流出口を備え標準沸点が100℃より高い高沸点液体の水溶液が収容される気化チャンバと、前記流出口から流出した蒸気の流量を調節する流量制御装置と、該気化チャンバ及び前記流量制御装置の所定箇所を加熱する加熱装置と、前記流量制御装置で流量制御された蒸気を放出する放出流路と、前記放出流路から分岐するドレン流路と、前記放出流路とドレン流路とを切り換える切換弁と、前記気化チャンバ内の水溶液中の高沸点液体の濃度が所定の推定濃度以上のときに前記切換弁を前記ドレン流路から前記放出流路に切り換える制御装置と、を備える。【選択図】 図1
