PROBLEM TO BE SOLVED: To provide a scattering X-ray removal-purpose grid manufacturing method and scattering X-ray removal-purpose grid manufacturing device that enable scattering X-ray removal-purpose grids in accordance with various types of a three-dimensional structure specification to be manufactured at low costs.SOLUTION: Information on a three-dimensional structure specification of an X-ray transmission part including at least a formation area of the X-ray transmission part on a substrate, and a target height of the X-ray transmission part is storageable in a control unit 1 as an execution parameter. A scattering X-ray removal-purpose grid manufacturing method is configured to: control to execute a three-dimensional molding program on the basis of a distance between the substrate and a definite point O and the execution parameter control to execute an initial layer molding process of molding a resin layer by an initial layer in accordance with a formation reference position coordinate (data on a slice layer such as a start point and end point, and the like) on the substrate, and a lamination molding process of laminating and molding the resin layer by an addition in accordance with a formation reference position coordinate on an existing layer even after the molding of the initial layer and enable the execution of the lamination molding process until a molding height arrives at a target height.SELECTED DRAWING: Figure 4【課題】各種立体構造仕様に応じた散乱X線除去用グリッドを低価格に製造することができる、散乱X線除去用グリッド製造方法及びその製造装置を提供することである。【解決手段】基板上におけるX線透過部の形成領域と、X線透過部の目標高さとを少なくとも含むX線透過部の立体構造仕様情報が実行パラメータとして制御部1に記憶可能になっている。基板と定点O間の距離と、該実行パラメータとに基づいて立体造形プログラムを実行制御して、基板上の形成基準位置座標(起点および終点等のスライス層のデータ)に応じて初期層分の樹脂層を基板上に造形する初期層造形工程と、初期層の造形以降においても、既成層上の形成基準位置座標に応じて上積み分の樹脂層を積層造形する積層造形工程と、を実行制御し、造形高さが目標高さに達するまで積層造形工程を実行可能になっている。【選択図】図4
