PROBLEM TO BE SOLVED: To provide a manufacturing method of a Josephson junction device which improves reproducibility of processing accuracy and is also suitable for mass production, and a Josephson junction device.SOLUTION: A manufacturing method of a Josephson junction device 1 comprising a lamination portion where a first superconducting film 2, an insulating film 4 and a second superconducting film 3 are laminated in this order, includes the steps of: providing, on the second superconducting film 3 in the lamination portion, a bottomed hole 5 which extends from a surface of the second superconducting film 3 towards the first superconducting film 2 but does not reach the insulating film 4 and irradiating a bottom part 5a of the bottomed hole 5 through the bottomed hole 5 with ion beams to form a weakly coupled part 4a in a portion of the insulating film 4 positioned in predetermined depth from the bottom part 5a, namely, in a portion of the insulating film 4 opposing the bottom part 5a. According to this method, any slope is not utilized and in a region where the bottomed hole 5 is not provided in the second superconducting film 3, the ion beams do not reach the insulating film 4, such that the weakly coupled part 4a can be easily formed.COPYRIGHT: (C)2014,JPO&INPIT【課題】加工精度の再現性が良く量産化にも適したジョセフソン接合素子の製造方法、ジョセフソン接合素子を提供する。【解決手段】第1の超伝導膜2、絶縁膜4、及び第2の超伝導膜3がこの順に積層された積層部分を有するジョセフソン接合素子1の製造方法であって、積層部分における第2の超伝導膜3に、第2の超伝導膜3の表面から第1の超伝導膜2の側へ向けて延び絶縁膜4まで達しない有底穴5を設ける工程と、有底穴5を通して有底穴5の底部5aへ向けイオンビームを照射することで、その底部5aから所定の深さに位置する絶縁膜4の部分、すなわち絶縁膜4の底部5aに対向する部分に弱結合部4aを形成する工程とを有する。この方法では、斜面を利用しない。また、第2の超伝導膜3のうち有底穴5が設けられていない領域ではイオンビームは絶縁膜4まで届かず容易に弱結合部4aを形成できる。【選択図】図2
