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Antibacterial resin composition
专利权人:
東罐マテリアル・テクノロジー株式会社;東洋製罐グループホールディングス株式会社
发明人:
大橋 和彰,小坂 泰啓,緒方 章子,川上 敬寛
申请号:
JP2012115004
公开号:
JP6087519B2
申请日:
2012.05.18
申请国别(地区):
JP
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a resin composition comprising a photocurable acrylic resin capable of forming a coated film capable of efficiently eluting an ion of a metal such as silver having antibacterial properties, and capable of exhibiting excellent antibacterial properties.SOLUTION: A photocurable acrylic resin composition comprising a photocurable acrylic resin, a photopolymerization initiator and a diluting solvent is regulated so that the diluting solvent may contain at least one kind of a compound selected from a metal compound represented by formula (1) and silver nicotinate. (In the formula, M is one of Ag, Cu, Zn, Co and Ni; and X is an atom or an atomic group selected from C, O, S and P).
来源网站:
中国工程科技知识中心
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http://www.ckcest.cn/home/

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