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Grid for radiation imaging and method for producing the same
专利权人:
Yasuhisa Kaneko
发明人:
Yasuhisa Kaneko
申请号:
US13521725
公开号:
US08989353B2
申请日:
2011.03.18
申请国别(地区):
US
年份:
2015
代理人:
摘要:
A conductive substrate (18) and an etching substrate (20) are bonded to each other. An etch mask (25) is formed on the etching substrate (20) using a photolithography technique. On the etching substrate (20), grooves (20a) and X-ray transmitting sections (14b) are formed by dry etching using Bosch process. The grooves (20a) are filled with Au (27) by an electroplating method using the conductive substrate (18) as an electrode. Thus, X-ray absorbing sections (14a) are formed.
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