The present invention addresses the problem of providing a photosensitive coloring composition with which it is possible to form a pattern with high light-blocking properties, high reliability, and exceptional surface smoothness, the composition being desirably used for forming a colored spacer in particular. This photosensitive coloring composition contains a coloring agent (a), an alkali-soluble resin (b), a photopolymerization initiator (c), an ethylenically unsaturated compound (d), a solvent (e), and a dispersant (f). The coloring agent (a) contains an organic pigment and carbon black. The alkali-soluble resin (b) contains an epoxy (meth)acrylate resin (b-I) and a (meth)acrylic copolymer resin (b-II), in which repeating units α that have an ethylenically unsaturated bond and repeating units β derived from an unsaturated carboxylic acid are contained in a side chain. The (meth)acrylic copolymer resin (b-II) contains at least 12 mol% of the repeating units α.
