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METHOD TO PATTERN <10 MICROMETER CONDUCTING AND PASSIVATING FEATURES ON 3D SUBSTRATES FOR IMPLANTABLE DEVICES
专利权人:
发明人:
Vanessa Tolosa,Satinderpall S. Pannu,Heeral Sheth,Angela C. Tooker,Kedar G. Shah,Sarah H. Felix
申请号:
US15637995
公开号:
US20170348534A1
申请日:
2017.06.29
申请国别(地区):
US
年份:
2017
代理人:
摘要:
An implantable device has a cylindrical base, at least one electrode on the cylindrical base, at least one electrically conducting lead on the cylindrical base connected to the electrode wherein the electrically conducting lead has a feature size of <10 micrometers. A protective coating on the cylindrical base covers the at least one electrically conducting lead.
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中国工程科技知识中心
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