METAL-FREE CVD COATING OF GRAPHENE ON GLASS AND OTHER DIELECTRIC SUBSTRATES

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专利权人:

发明人:

申请号：

EP15709384.0

公开号：

EP3107550A1

申请日:

2015.02.13

申请国别(地区):

EP

年份:

2016

代理人:

摘要：

A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/