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Radiation imaging grid, manufacturing method thereof, and radiation imaging system
专利权人:
富士フイルム株式会社
发明人:
金子 泰久
申请号:
JP2011191911
公开号:
JP5204880B2
申请日:
2011.09.02
申请国别(地区):
JP
年份:
2013
代理人:
摘要:
In a second grid, X-ray absorbing portions and X-ray transparent portions extending in a Y direction are alternately arranged in an X direction. After the manufacture of the second grid, a defective portion is detected in the second grid. A rectangular area to be cut out is set along the X and Y directions so as to enclose this defective portion. By cutting out the rectangular area, a cutout is formed. A micro grid, which is smaller than the cutout, is fitted into the cutout such that two adjoining sides of the micro grid are in contact with two adjoining sides of the cutout. A gap left between an outline of the cutout and the micro grid is filled with Sn—Pb as an X-ray absorbing material.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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