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Measurement Systems, Lithographic Apparatus, Device manufacturing Method and a Method of Measuring
专利权人:
ASML Netherlands B.V.
发明人:
NIHTIANOV Stoyan
申请号:
US201615738695
公开号:
US2018173115(A1)
申请日:
2016.05.31
申请国别(地区):
美国
年份:
2018
代理人:
摘要:
A measurement system for measuring a position and/or displacement of an object (40), the measurement system comprising a sensor (20) and a target (45), the sensor comprising an electromagnet (21); a driving circuit (24) configured to drive the electromagnet to generate an alternating magnetic field (AMF); a measuring circuit (25) configured to measure an electrical impedance parameter of the electromagnet; the target being located on a surface (41) of the object that faces the sensor, wherein the target comprises a graphene layer (46), and wherein, in use, when the alternating magnetic field interacts with the target, the alternating magnetic field changes (RMF), altering the electrical impedance parameter of the electromagnet.
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http://www.ckcest.cn/home/

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