Apparatus for the removal of exhaust gases are provided herein. In some embodiments, an exhaust apparatus may include a housing defining an inner volume, an inlet and an outlet formed in the housing to facilitate flow of an exhaust gas through the inner volume, wherein the inlet is configured to be coupled to an exhaust outlet of a semiconductor process chamber to receive the exhaust gas therefrom, and wherein the exhaust gas can flow through the inner volume substantially free from obstruction, an ultraviolet light source to provide ultraviolet energy to the exhaust gas present the inner volume during use, wherein the ultraviolet light source provides sufficient energy to at least partially decompose the exhaust gas, and a conduit coupled to the outlet and configured allow at least some ultraviolet energy provided from the ultraviolet light source to travel directly along an axial length of the conduit.
