ANHYDROUS POLYMORPHIC FORM B OF BOSENTAN AND USES THEREOF

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专利权人:

CIPLA LIMITED

发明人:

RAO, DHARMARAJ, RAMACHANDRA,KANKAN, RAJENDRA, NARAYANRAO,PHULL, MANJINDER, SINGH,SAWANT, ASHWINI, AMOL

申请号：

NZ58690009

公开号：

NZ586900A

申请日:

2009.01.02

申请国别(地区):

NZ

年份:

2012

代理人:

摘要：

Disclosed is anhydrous bosentan polymorphic Form B, characterised by having an XRPD pattern comprising peaks at 9.6, 16.1, 17.1, 18.4 and 5 21.8 °2q + 0.2°2q. Further disclosed is a process for preparing the above anhydrous polymorphic form which comprises: adding bosentan to a mixture of ethyl acetate and heptane, heating the mixture to the reflux temperature of the solvent mixture, cooling the mixture to a temperature ranging from 20°C to 30°C, and drying the resulting solid at a temperature above 60°C to obtain anhydrous bosentan Form B.

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