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氣體處理裝置
专利权人:
发明人:
NAITO, KEISUKE,内藤敬佑,內藤敬祐
申请号:
TW108131596
公开号:
TW202033227A
申请日:
2019.09.03
申请国别(地区):
TW
年份:
2020
代理人:
摘要:
The subject of the present invention is to provide a gas processing device capable of suppressing a situation in which the ability to process a gas to be processed containing VOCs decreases over time.The solution is a gas processing device that includes a frame, a gas to be processed containing VOC, is introduced into the suction port inside the frame, is housed inside the frame, and is filled with discharge gas inside, and includes An excimer lamp with a long tube extending in the first direction, and the treated gas irradiated with ultraviolet rays emitted from the excimer lamp is led out to the exhaust port on the outside of the frame and from the inside of the frame , A cleaning mechanism that sprays the first fluid for cleaning containing water on the surface of the tube.本發明的課題,係提供可抑制處理包含VOC之被處理氣體的能力經時降低之狀況的氣體處理裝置。解決手段是一種氣體處理裝置,具備:框體、將包含VOC的被處理氣體,導入至框體的內側的吸氣口、收容於框體的內側,於內部填充放電用氣體所成,且包含呈現延伸於第一方向之長條形狀的管體的準分子燈、將被照射從準分子燈射出之紫外線的被處理氣體,導出至框體的外側的排氣口、及從框體的內側,對於管體的表面噴射包含水分之洗淨用的第一流體的洗淨機構。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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