RAVENSBERGEN, Janneke,PANDEY, Nitesh,ZHOU, Zili,KOOLEN, Armand,GOORDEN, Sebastianus,FAGGINGER AUER, Bastiaan,MATHIJSSEN, Simon
申请号：
WO2018EP62547
公开号：
WO2018219639(A1)
申请日:
2018.05.15
申请国别(地区):
世界知识产权组织国际局
年份:
2018
代理人:
摘要：
A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.
