JOHANNES PIETER DE PENNING,PAULIEN SMITS,WOUTER BASTIAAN ZEPER
申请号：
NL2017822
公开号：
NL2017822B1
申请日:
2016.11.18
申请国别(地区):
NL
年份:
2018
代理人:
摘要：
The invention relates to an electrode arrangement to be coupled to a high voltage source for a dielectric barrier discharge plasma treatment of an irregularly three-dimensionally shaped surface of an electrically conducting body, which surface is used as a counter electrode. A first electrode is coupled to the high voltage source via a first lead, fitted to the object to be treated and brought in contact with a dielectric. A second electrode is contacted with the surface to be treated as reference electrode, said second electrode provided in an edge portion being circumferential to the first electrode and to be coupled to a reference voltage source via a second lead. An isolating cover layer covers the electrode and a third electrode covers said isolating cover layer as a ground electrode.
