ガス処理装置

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专利权人:

アズビル株式会社

发明人:

大矢 康裕,岩田 昌之,井口 俊丸

申请号：

JP2009005560

公开号：

JP5242425B2

申请日:

2009.01.14

申请国别(地区):

JP

年份:

2013

代理人:

摘要：

PROBLEM TO BE SOLVED: To eliminate the need for using a large-scale high-voltage power supply to reduce a cost.

SOLUTION: A gas treatment apparatus is provided with a high voltage applying means 20. A first electrode 8 of a honeycomb structure 4 is connected to a positive voltage supply terminal T1 of the high voltage applying means 20. A second electrode 9 of the honeycomb structure 4 is connected to a negative voltage supply terminal T2 of the high voltage applying means 20. Driving pulse PS is given to a base of transistors Q1, Q2 in the high voltage applying means 20, and a positive voltage +V1 rising in the positive direction from a grounding potential is applied to the first electrode 8 and a negative voltage -V2 falling in the negative direction from the grounding potential is applied to the second electrode 9, by alternately shifting the positive voltage and negative voltage. This allows a differential voltage V1+V2 (high voltage) between the positive voltage +V1 and negative voltage -V2 to be periodically applied to between the first electrode 8 and the second electrode 9, thereby eliminating the need for using the large-scale high-voltage power supply.

COPYRIGHT: (C)2010,JPO&INPIT

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中国工程科技知识中心

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