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高分子機能性膜の製造方法
专利权人:
富士フイルム株式会社
发明人:
原田 基,高本 哲文
申请号:
JP20140045736
公开号:
JP6118284(B2)
申请日:
2014.03.07
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a method for producing a polymer functional film that is excellent in durability even when the film thickness of the polymer functional film is thick.SOLUTION: The method for producing a polymer functional film comprises polymerizing and curing a composition including a monomer and a photopolymerization initiator. The film thickness of the polymer functional film is more than 500 μm and not more than 1,000 μm. At least one kind of monomers is a styrenic monomer or an acrylic amide monomer each having a quaternary ammonium group or a sulfo group or a salt thereof. The photopolymerization initiator uses a combination of at least one kind of (I-1) photopolymerization initiator having a maximum absorption wavelength of not less than 300 nm and less than 350 nm and at least one kind of (I-2) photopolymerization initiator having a maximum absorption wavelength of not less than 350 nm and not more than 420 nm.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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