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DEPOSITING MATERIAL WITH ANTIMICROBIAL PROPERTIES ON PERMEABLE SUBSTRATE USING ATOMIC LAYER DEPOSITION
专利权人:
Sang In LEE
发明人:
Sang In LEE
申请号:
US13535155
公开号:
US20130022658A1
申请日:
2012.06.27
申请国别(地区):
US
年份:
2013
代理人:
摘要:
Embodiments relate to depositing a layer of antimicrobial material such as silver on a permeable substrate using atomic layer deposition (ALD). A deposition device includes two injectors that inject source precursor, reactant precursor, purge gas or a combination thereof onto the permeable substrate that passes between the injectors. Part of the gas injected by an injector penetrates the permeable substrate and is discharged by the other injector. The remaining gas injected by the injector moves in parallel to the surface of the permeable substrate and is discharged via an exhaust portion formed on the same injector. While penetrating the substrate or moving in parallel to the surface, the source precursor or the reactant precursor becomes absorbed on the substrate or react with precursor already present on the substrate to deposit the antimicrobial material on the substrate.
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中国工程科技知识中心
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