荷電粒子ビーム照射システム
- 专利权人:
- 株式会社日立製作所
- 发明人:
- 梅澤 真澄,松田 浩二,藤本 林太郎,藤高 伸一郎
- 申请号：
- JP2010045396
- 公开号：
- JP5280390B2
- 申请日:
- 2010.03.02
- 申请国别(地区):
- JP
- 年份:
- 2013
- 代理人:
- 摘要：
To provide a charged particle beam irradiation system capable of shortening the irradiation time in a particle beam therapy by a SPOT scanning method.
SOLUTION: The charged particle beam irradiation system 100 includes a charged particle beam generator 200, a beam transport system 300, and an irradiation device 500. A controller 600 computes a beam position/width every time the irradiation of an irradiation section is completed from output obtained from a beam position measuring apparatus 53 inside the irradiation device 500. The controller 600 continues irradiation to the next irradiation section even during the computation.
COPYRIGHT: (C)2011 and JPO& INPIT
- 来源网站：
- 中国工程科技知识中心
