Pil Joon PARK,So Hee LEE,Eun Gyung CHO,Tae Ryong LEE
申请号：
US15305433
公开号：
US20170035828A1
申请日:
2015.04.29
申请国别(地区):
US
年份:
2017
代理人:
摘要：
The present invention relates to a composition containing a Scutellaria alpina extract as an active ingredient. The composition of the present invention exhibits effects of reducing the amount of endothelin 1 by containing a Scutellaria alpina extract, and reducing the overexpression of NK1R and EDN1 genes. Therefore, the Scutellaria alpina extract of the present invention can exhibit, by said effects, skin homeostasis maintenance and anti-stress effects, and thus can be widely used as a composition for maintaining skin homeostasis in the pharmaceutical or cosmetic field.
