Provided is a system for irradiating particle beam in a particle beam therapy apparatus enabling high speed scanning of particle beam even when the size of irradiation range is large.The system for irradiating particle beam of the present invention includes a first deflecting device (21) having a maximum deflection amount allowing the particle beam to be moved in one direction to a maximum width of a target, and a second deflecting device (22) having a maximum defection amount by which the particle beam (1) is defected in the one direction less than the maximum deflection amount of the first deflecting device (21). When the particle beam is moved, a control is performed such that the deflection amount of the second deflecting device (22) is increased and the particle beam is moved. When the particle beam is halted, a deflection substitution control for gradually substituting the deflection of the first deflecting device (21) for the defection of the second deflecting device (22) is performed, such that the deflection amount of the second deflecting device (22) is decreased, and the defection amount of the first deflecting device (21) is varied, so as to halt the position of the particle beam on the target.本發明提供一種即使在粒子線治療裝置中,所需之照射範圍尺寸大時,亦可進行粒子線之高速掃描之粒子線照射系統。本發明之粒子線照射系統係具備:第一偏向裝置(21),具有可使粒子線朝一方向移動至標的之最大寬度之最大偏向量;及第二偏向裝置(22),使粒子線(1)朝前述一方向偏向之最大偏向量比第一偏向裝置(21)之最大偏向量為少;其中,在粒子線之移動時係進行使第二偏向裝置(22)之偏向量增加並使粒子線移動之控制,在粒子線之停留時係進行使第二偏向裝置(22)之偏向置換為第一偏向裝置(21)之偏向的偏向置換控制,以使第二偏向裝置(22)之偏向量減少,並且使第一偏向裝置之偏向量變化,而使標的之粒子線的位置停留。1...粒子線2...X方向掃描裝置4...經掃描之粒子線8...掃描控制裝置9...治療計畫裝置21...X方向第一偏向裝置22...X方向第二偏向裝置23...X方向第一電源24...X方向第一偏向電磁鐵25...X方向第二電源26...X方向第二偏向電磁鐵81...掃描控制演算部82...射束位置移動控制演算部83...射束位置停留控制演算部84...X方向第一偏向裝置控制部85...X方向第二偏向裝置控制部
