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Plasma vapor chamber and antimicrobial applications thereof
专利权人:
发明人:
James Ferrell,Erinn R. Bogovich,Robert L. Gray,Daphne Pappas Antonakas,Tsung-Chan Tsai,Sameer Kalghatgi
申请号:
US15041102
公开号:
US09662412B2
申请日:
2016.02.11
申请国别(地区):
US
年份:
2017
代理人:
摘要:
Exemplary apparatuses and methods of killing or deactivating bacteria are disclosed herein. An exemplary apparatus for killing or deactivating bacteria includes a plasma vapor chamber. The plasma vapor chamber has a vapor inlet for allowing a vapor into the chamber, a high voltage electrode, one or more grounding electrodes. The one or more grounding electrodes at least partially surrounding the plasma vapor chamber. The plasma vapor chamber includes an outlet for allowing fluid to flow out of the chamber. When the chamber is filled with vapor for a period of time sufficient to saturate the chamber with vapor, the high voltage electrode is energized to generate plasma throughout the chamber.
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