Martin L. Yarmush,Erkin Seker,Yevgeny Berdichevsky
申请号：
US13822747
公开号：
US09070492B2
申请日:
2011.09.13
申请国别(地区):
US
年份:
2015
代理人:
摘要：
A method is disclosed for fabricating a low-impedance nanoporous metal multiple electrode array for measuring electrophysiology activity. A patterned photoresist is applied to a substrate, in which the patterned photoresist corresponds to a pattern of the nanoporous metal multiple electrode array. A metal alloy including a sacrificial alloying element is deposited in the pattern of the nanoporous metal electrode array. The patterned photoresist is removed to expose the metal alloy as deposited. At least part of the sacrificial alloying element is removed from the metal alloy to create nanoporous metal electrode tips thereby forming the nanoporous metal multiple electrode array. The resultant nanoporous metal multiple electrode array has improved impedance characteristics in comparison to conventional multiple electrode arrays.
