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電磁鐵支架、電磁鐵裝置及粒子線治療裝置
专利权人:
MITSUBISHI ELECTRIC CORPORATION
发明人:
INOUE, HIROMITSU,井上光,OBATA, JUN,小畑顺,小畑順
申请号:
TW105101215
公开号:
TWI565370B
申请日:
2016.01.15
申请国别(地区):
TW
年份:
2017
代理人:
摘要:
The present invention provides an electromagnet rack, which is disposed in an apparatus chamber with an electromagnet and is capable to diminish a distribution space of power cables of the electromagnet. The electromagnet rack (1) comprise: a ceiling plate (11) supporting the electromagnet (2a); a plurality of legs (13) supporting the ceiling plate (11); and a cable distribution element (12) fixed at the plurality of legs (13) and disposed under the ceiling plate (11). A cable distribution portion (16), where the power cables (4) of the electromagnet (2a) is disposed and extended along a moving direction of charged particle beams (51), is formed between the cable distribution element (12) and the ceiling plate (11). A cable distribution wideness (a length between the legs in a wideness direction (L1)), which is the length of the direction perpendicular to the moving direction of the charged particle beams (51), is greater than a wideness (Mw) of the direction perpendicular to the moving direction of the charged particle beams (51) of the electromagnet (2a).本發明之目的係提供一種電磁鐵支架,係在配置有電磁鐵的設備室當中,能減少電磁鐵之電源電纜配置空間。電磁鐵支架(1)之特徵在於具備:頂板(11),係支持電磁鐵(2a);複數個腳(13),係支持頂板(11);以及電纜配置構件(12),係固定於複數個腳(13),並且配置於頂板(11)的下側;其中,用以將電磁鐵(2a)的電源電纜(4)沿著荷電粒子射束(51)的行進方向延伸而配置之電纜配置部(16)係形成於電纜配置構件(12)和頂板(11)之間,電纜配置部(16)之與荷電粒子射束(51)的行進方向垂直的方向的長度之電纜配置寬度(寬度方向腳間長度(L1)),係較電磁鐵(2a)之與荷電粒子射束(51)的行進方向垂直的方向的寬度(Mw)為更長。
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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