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プラズマ照射処理装置
专利权人:
独立行政法人産業技術総合研究所
发明人:
榊田 創,池原 譲,木山 学
申请号:
JP2012523819
公开号:
JP5637402B2
申请日:
2011.06.27
申请国别(地区):
JP
年份:
2014
代理人:
摘要:
A plasma treatment equipment free from a risk of generation of discharge on an object to be treated, capable of starting of plasma generation easily and reliably and maintaining the state of a mild plasma jet stably without any fluctuations is provided A plasma treatment equipment including: a plasma starting and stabilizing unit (A) having an insulating material such as a dielectric material having an elongated hole connecting to a plasma ejection portion, a triggering and discharge-stabilizing electrode, and an intense electric field electrode mounted thereon and a plasma generating unit (B) including the insulating material having the elongated hole and a plasma generating electrode configured to perform main plasma generation at the time of operation, wherein the triggering and discharge-stabilizing electrode, the intense electric field electrode, and the plasma generating electrode are provided in such a manner that all the electrodes are not exposed and covered with the dielectric material for the entire space of one or more of the elongated hole which allows passage of gas from the upstream, starting of the plasma and generation of the plasma, and ejection of the plasma jet.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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