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Method For Determining Wave-Front Aberration Data Of A To-Be-Tested Optical System
专利权人:
ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)
发明人:
Martha HERNANDEZ CASTANEDAS,Gildas MARIN,Larry THIBOS,Tao LIU
申请号:
US14897205
公开号:
US20160135678A1
申请日:
2014.06.09
申请国别(地区):
US
年份:
2016
代理人:
摘要:
A method for determining wave-front aberration data of a to-be-tested optical system comprising the steps of: a) providing a wave-front sensing image of light received from the tested optical system; b) providing a model representative of the optical system with at least an optical parameter representative of said model; and c) optimizing a set of wave-front coefficient data and said at least optical parameter of said model according to a merit function calculating the merit function comprises the steps of generating a wave-front sensing modeled image of light received from said model by the at least optical parameter and the set of wave-front coefficient data, and calculating a criteria based on shape parameter data of the wave-front sensing image and shape parameter data of the wave-front sensing modeled image, so as to obtain wave-front aberration data of the tested optical system.
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