Gregor Morfill,Yangfang Li,Julia Zimmermann,Tetsuji Shimizu
申请号：
US14115789
公开号：
US20140207053A1
申请日:
2012.05.04
申请国别(地区):
US
年份:
2014
代理人:
摘要：
The invention relates to a device for the plasma treatment of surfaces (47), in particular of skin, having a housing (3), a plasma source (5) allocated to the housing (3), and at least one spacer (21) that is provided on the housing (3) and/or the plasma source (5) in such a manner that a distance (d) between the plasma source (5) and a surface (47) to be treated can be maintained at least in some regions. The device is characterized in that the spacer (21) is designed to be adjustable in order to vary the distance (d) and that the distance (d) can be varied in such a manner that a preferred plasma chemistry can be selected at the location of the surface (47) to be treated.
