VASCHENKO, GEORGIY, O.,ERSHOV, ALEXANDER, I.,SANDSTROM, RICHARD, L.
申请号：
EP11753705
公开号：
EP2544766A4
申请日:
2011.03.01
申请国别(地区):
EP
年份:
2016
代理人:
摘要：
A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.
