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VORRICHTUNG ZUR PHOTOAKUSTISCHEN MESSUNG UND SIGNALVERARBEITUNGSVERFAHREN FÜR VORRICHTUNG ZUR PHOTOAKUSTISCHEN MESSUNG
专利权人:
FUJIFILM Corporation
发明人:
HASHIMOTO, Atsushi,IRISAWA, Kaku,OSAWA, Atsushi,INOUE, Tomoki
申请号:
EP16850642
公开号:
EP3357430A4
申请日:
2016.09.21
申请国别(地区):
EP
年份:
2018
代理人:
摘要:
A photoacoustic measurement device capable of reducing artifacts caused by photoacoustic waves generated at a surface portion of a subject on which measurement light is incident, and a signal processing method thereof are obtained. A photoacoustic measurement device (10) includes region discrimination means (24) that discriminates an artifact generation region and an artifact non-generation region in a photoacoustic image on the basis of a positional relationship between a light emitting portion (40) and an acoustic wave detection portion (20), and filter means (24) for performing a first filtering process on a first photoacoustic wave detection signal corresponding to a photoacoustic image of the artifact non-generation region and performing a second filtering process on a second photoacoustic wave detection signal corresponding to a photoacoustic image of the artifact generation region. The second filtering process includes further reducing the photoacoustic wave detection signal in a frequency range lower than a predetermined frequency as compared with the first filtering process.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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