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NAIL LACQUER COMPOSITION CONTAINING CICLOPIROX
专利权人:
KOLMAR KOREA
发明人:
Nam-hyang KIM,Yong-baik CHO,Sang-young JEONG,Byoung-chan BAE,Jae-seong LEE,Ji-won LEE,Hong-koo CHO
申请号:
US15555619
公开号:
US20180104227A1
申请日:
2016.03.09
申请国别(地区):
US
年份:
2018
代理人:
摘要:
The present invention relates to a nail lacquer composition containing at least one antifungal agent as a pharmacologically active ingredient. The present invention has an excellent penetrating effect of a drug in skin areas where the drug is applied because of needing treatment and, specifically, in fingernails by containing a polymer material which forms a specific film, and a penetration enhance, is convenient for management after locally applying the drug to a treatment site, and has excellent storage stability of the drug.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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