Rolando A. Gittens Ibacache,Jonathan Vernon,Kenneth H. Sandhage,Barbara D. Boyan
申请号：
US14362468
公开号：
US20140329052A1
申请日:
2012.12.07
申请国别(地区):
US
年份:
2014
代理人:
摘要：
The present invention provides implant devices comprising nanoscale structures on the surface thereof and methods of manufacturing such implant devices. In some embodiments, methods of manufacturing an implant device comprise exposing a surface of the implant device to an oxidative hydrothermal environment for a duration sufficient to generate nanoscale structures on the exposed surface(s) of the implant device.
