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PLASMA EVALUATION APPARATUS
专利权人:
发明人:
申请号:
EP12851481.7
公开号:
EP2782430B1
申请日:
2012.10.22
申请国别(地区):
EP
年份:
2016
代理人:
摘要:
[Problem] To provide a system and a method for objectively evaluating plasma by easily measuring a current generated by a plasma treatment equipment for medical purposes, etc., and a current flowing through a living body, etc.[Solution] A plasma evaluation system and method for evaluating plasma, including: a treatment target material and a weak current measurement unit including a resistor unit and a differential amplifier, wherein the treatment target material is connected to the weak current measurement unit via a treatment target side measurement terminal, the resistor unit of the weak current measurement unit is connected to a ground side of a plasma generation current source, and the system and method evaluate plasma by receiving plasma generated by a plasma treatment equipment with the treatment target material, measuring a current by measuring a voltage across resistors of the resistor unit through the differential amplifier, and measuring an output voltage of the plasma generation power source.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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