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Plasma evaluation apparatus
专利权人:
发明人:
Hajime Sakakita,Yuzuru Ikehara,Satoru Kiyama
申请号:
US14359970
公开号:
US09254397B2
申请日:
2012.10.22
申请国别(地区):
US
年份:
2016
代理人:
摘要:
The present invention provides a plasma evaluation system and method for evaluating plasma, including: a treatment target material and a weak current measurement unit including a resistor unit and a differential amplifier, wherein the treatment target material is connected to the weak current measurement unit via a treatment target side measurement terminal, the resistor unit of the weak current measurement unit is connected to a ground side of a plasma generation current source, and the system and method evaluate plasma by receiving plasma generated by a plasma treatment equipment with the treatment target material, measuring a current by measuring a voltage across resistors of the resistor unit through the differential amplifier, and measuring an output voltage of the plasma generation power source.
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