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SYSTEM AND RELATED METHODS FOR MONITORING AND ADJUSTING ACTUAL SEED DEPTHS DURING A PLANTING OPERATION BASED ON SOIL MOISTURE CONTENT
专利权人:
CNH Industrial America LLC
发明人:
Ivan Antich
申请号:
US16152943
公开号:
US20200107487A1
申请日:
2018.10.05
申请国别(地区):
US
年份:
2020
代理人:
摘要:
In one aspect, a method is disclosed for adjusting a seed depth associated with depositing a seed within a furrow in a field during a planting operation of an agricultural implement. The method may include determining, by a computing device, a target seed depth based on a moisture content of the soil within the field; sensing, by the computing device, a seed depth parameter indicative of a seed depth of the seed relative to a ground surface of the field; comparing, by the computing device, the seed depth parameter to a target seed depth parameter that describes the target seed depth; and initiating, by the computing device, a control action configured to adjust the seed depth parameter towards the target seed depth parameter.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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