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PROCÉDÉ DE LAVAGE DE BASE DE LEVAGE D'OUTIL DE TRAITEMENT
专利权人:
FUJIFILM Corporation
发明人:
申请号:
EP16836896.7
公开号:
EP3338618B1
申请日:
2016.07.07
申请国别(地区):
EP
年份:
2019
代理人:
摘要:
Provided is a method for washing a treatment tool stand that can efficiently perform the operation of washing the treatment tool stand in a short time without taking substantial time and effort. The method for washing a treatment tool stand related to the invention is a method for washing a treatment tool stand of an endoscope using a stand washing tool having a first washing member formed to a first height position and a second washing member formed to a second height position lower than the first height position. The washing method comprises a first washing member inserting step of inserting the first washing member into a gap between a stand storage wall section of the endoscope and the treatment tool stand; a second washing member abutting step of making the second washing member abut against a treatment tool guide surface of the treatment tool stand; and a stand washing tool moving step of moving the stand washing tool along the treatment tool guide surface in a state where the first washing member is inserted into the gap and the second washing member is made to abut against the treatment tool guide surface.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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