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ALIGNMENT OF LIGHT SOURCE FOCUS
专利权人:
发明人:
申请号:
EP11810187.2
公开号:
EP2595702A1
申请日:
2011.07.14
申请国别(地区):
EP
年份:
2013
代理人:
摘要:
An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
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